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Artigo de periodico
Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator (2022)
Penacchio, Rafaela Felix da Silva ; Fornari, Celso I.; Camillo, Yorí G.; Kagerer, Philipp; Buchberger, Sebastian; Kamp, Martin; Bentmann, Hendrik; Reinert, Friedrich; Morelhão, Sergio Luiz
Source: Thin Solid Films. Unidade: IF
Subjects: FÍSICA DA MATÉRIA CONDENSADA, FILMES FINOS, DIFRAÇÃO POR RAIOS X, MATERIAIS NANOESTRUTURADOS, EPITAXIA POR FEIXE MOLECULAR, CAMPO MAGNÉTICO
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ABNT
PENACCHIO, Rafaela Felix da Silva et al. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator. Thin Solid Films, v. 750, 2022Tradução . . Disponível em: https://doi.org/10.1016/j.tsf.2022.139183. Acesso em: 27 abr. 2024.
APA
Penacchio, R. F. da S., Fornari, C. I., Camillo, Y. G., Kagerer, P., Buchberger, S., Kamp, M., et al. (2022). Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator. Thin Solid Films, 750. doi:10.1016/j.tsf.2022.139183
NLM
Penacchio RF da S, Fornari CI, Camillo YG, Kagerer P, Buchberger S, Kamp M, Bentmann H, Reinert F, Morelhão SL. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator [Internet]. Thin Solid Films. 2022 ; 750[citado 2024 abr. 27 ] Available from: https://doi.org/10.1016/j.tsf.2022.139183
Vancouver
Penacchio RF da S, Fornari CI, Camillo YG, Kagerer P, Buchberger S, Kamp M, Bentmann H, Reinert F, Morelhão SL. Statistical modeling of epitaxial thin films of an intrinsic antiferromagnetic topological insulator [Internet]. Thin Solid Films. 2022 ; 750[citado 2024 abr. 27 ] Available from: https://doi.org/10.1016/j.tsf.2022.139183
Relatorio tecnico
A simple recipe to create three-dimensional reciprocal space maps (2022)
Penacchio, Rafaela Felix da Silva ; Fornari, Celso I.; Kagerer, Philipp; Dittmar, Marco; Müller, Simon; Reinert, Friedrich; Estradiote, Maurício Bastos ; Morelhão, Sergio Luiz
Unidade: IF
Subjects: TOPOLOGIA, RAIOS X
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ABNT
PENACCHIO, Rafaela Felix da Silva et al. A simple recipe to create three-dimensional reciprocal space maps. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/pdf/2210.05427.pdf. Acesso em: 27 abr. 2024. , 2022
APA
Penacchio, R. F. da S., Fornari, C. I., Kagerer, P., Dittmar, M., Müller, S., Reinert, F., et al. (2022). A simple recipe to create three-dimensional reciprocal space maps. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/pdf/2210.05427.pdf
NLM
Penacchio RF da S, Fornari CI, Kagerer P, Dittmar M, Müller S, Reinert F, Estradiote MB, Morelhão SL. A simple recipe to create three-dimensional reciprocal space maps [Internet]. 2022 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/2210.05427.pdf
Vancouver
Penacchio RF da S, Fornari CI, Kagerer P, Dittmar M, Müller S, Reinert F, Estradiote MB, Morelhão SL. A simple recipe to create three-dimensional reciprocal space maps [Internet]. 2022 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/2210.05427.pdf
Relatorio tecnico
Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films (2020)
Morelhão, Sergio Luiz ; Kycia, Stefan; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo
Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, SEMICONDUTORES, CRISTALOGRAFIA DE RAIOS X
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ABNT
MORELHÃO, Sergio Luiz et al. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. . Melville: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/pdf/2007.15042.pdf. Acesso em: 27 abr. 2024. , 2020
APA
Morelhão, S. L., Kycia, S., Netzke, S., Fornari, C. I., Rappl, P. H. O., & Abramof, E. (2020). Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. Melville: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/pdf/2007.15042.pdf
NLM
Morelhão SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. 2020 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/2007.15042.pdf
Vancouver
Morelhão SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. 2020 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/2007.15042.pdf
Artigo de periodico
Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators (2019)
Morelhão, Sérgio L. ; Kycia, Stefan W.; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo
Source: The Journal of Physical Chemistry C. Unidade: IF
Subjects: RADIAÇÃO SINCROTRON, SEMICONDUTORES (FÍSICO-QUÍMICA), MATERIAIS NANOESTRUTURADOS, EPITAXIA POR FEIXE MOLECULAR, CRISTALOGRAFIA, BISMUTO
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ABNT
MORELHÃO, Sérgio L. et al. Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. The Journal of Physical Chemistry C, v. 123, n. 40, p. 24818-24825, 2019Tradução . . Disponível em: https://doi-org.ez67.periodicos.capes.gov.br/10.1021/acs.jpcc.9b05377. Acesso em: 27 abr. 2024.
APA
Morelhão, S. L., Kycia, S. W., Netzke, S., Fornari, C. I., Rappl, P. H. O., & Abramof, E. (2019). Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators. The Journal of Physical Chemistry C, 123( 40), 24818-24825. doi:10.1021/acs.jpcc.9b05377
NLM
Morelhão SL, Kycia SW, Netzke S, Fornari CI, Rappl PHO, Abramof E. Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators [Internet]. The Journal of Physical Chemistry C. 2019 ; 123( 40): 24818-24825.[citado 2024 abr. 27 ] Available from: https://doi-org.ez67.periodicos.capes.gov.br/10.1021/acs.jpcc.9b05377
Vancouver
Morelhão SL, Kycia SW, Netzke S, Fornari CI, Rappl PHO, Abramof E. Dynamics of Defects in van der Waals Epitaxy of Bismuth Telluride Topological Insulators [Internet]. The Journal of Physical Chemistry C. 2019 ; 123( 40): 24818-24825.[citado 2024 abr. 27 ] Available from: https://doi-org.ez67.periodicos.capes.gov.br/10.1021/acs.jpcc.9b05377
Relatorio tecnico
Lateral lattice coherence lengths in thin lms of bismuth telluride topological insulators, with overview on polarization factors for X-ray dynamical di raction in monochromator crystals (2019)
Morelhão, Sergio Luiz ; Kycia, Stefan; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.
Unidade: IF
Subjects: NANOPARTÍCULAS, RAIOS X
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ABNT
MORELHÃO, Sergio Luiz et al. Lateral lattice coherence lengths in thin lms of bismuth telluride topological insulators, with overview on polarization factors for X-ray dynamical di raction in monochromator crystals. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/abs/1911.00396. Acesso em: 27 abr. 2024. , 2019
APA
Morelhão, S. L., Kycia, S., Netzke, S., Fornari, C. I., & Rappl, P. H. O. (2019). Lateral lattice coherence lengths in thin lms of bismuth telluride topological insulators, with overview on polarization factors for X-ray dynamical di raction in monochromator crystals. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/abs/1911.00396
NLM
Morelhão SL, Kycia S, Netzke S, Fornari CI, Rappl PHO. Lateral lattice coherence lengths in thin lms of bismuth telluride topological insulators, with overview on polarization factors for X-ray dynamical di raction in monochromator crystals [Internet]. 2019 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/abs/1911.00396
Vancouver
Morelhão SL, Kycia S, Netzke S, Fornari CI, Rappl PHO. Lateral lattice coherence lengths in thin lms of bismuth telluride topological insulators, with overview on polarization factors for X-ray dynamical di raction in monochromator crystals [Internet]. 2019 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/abs/1911.00396
Relatorio tecnico
X-ray tools for van der waals epitaxy of bismuth telluride topological insulator films (2018)
Kycia, Stefan; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo; Morelhao, Sergio Luiz
Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, SEMICONDUTORES, CRISTALOGRAFIA DE RAIOS X
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ABNT
KYCIA, Stefan et al. X-ray tools for van der waals epitaxy of bismuth telluride topological insulator films. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/abs/1812.10804. Acesso em: 27 abr. 2024. , 2018
APA
Kycia, S., Netzke, S., Fornari, C. I., Rappl, P. H. O., Abramof, E., & Morelhao, S. L. (2018). X-ray tools for van der waals epitaxy of bismuth telluride topological insulator films. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/abs/1812.10804
NLM
Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E, Morelhao SL. X-ray tools for van der waals epitaxy of bismuth telluride topological insulator films [Internet]. 2018 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/abs/1812.10804
Vancouver
Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E, Morelhao SL. X-ray tools for van der waals epitaxy of bismuth telluride topological insulator films [Internet]. 2018 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/abs/1812.10804
Artigo de periodico
Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films (2018)
Morelhao, Sergio Luiz; Kycia, Stefan; Netzke, Samuel; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo
Source: Applied Physics Letters. Unidade: IF
Subjects: DIFRAÇÃO POR RAIOS X, SEMICONDUTORES, CRISTALOGRAFIA DE RAIOS X
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ABNT
MORELHAO, Sergio Luiz et al. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. Applied Physics Letters, v. 112, n. 12, p. 101903, 2018Tradução . . Disponível em: https://aip.scitation.org/doi/10.1063/1.5020375. Acesso em: 27 abr. 2024.
APA
Morelhao, S. L., Kycia, S., Netzke, S., Fornari, C. I., Rappl, P. H. O., & Abramof, E. (2018). Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films. Applied Physics Letters, 112( 12), 101903. doi:10.1063/1.5020375
NLM
Morelhao SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. Applied Physics Letters. 2018 ; 112( 12): 101903.[citado 2024 abr. 27 ] Available from: https://aip.scitation.org/doi/10.1063/1.5020375
Vancouver
Morelhao SL, Kycia S, Netzke S, Fornari CI, Rappl PHO, Abramof E. Hybrid reflections from multiple x-ray scattering in epitaxial bismuth telluride topological insulator films [Internet]. Applied Physics Letters. 2018 ; 112( 12): 101903.[citado 2024 abr. 27 ] Available from: https://aip.scitation.org/doi/10.1063/1.5020375
Artigo de periodico
Structural properties of 'BI' IND. 2''TE' IND. 3' topological insulator thin films grown by molecular beam epitaxy on (111) 'BA''F' IND. 2' substrates (2016)
Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo; Morelhao, Sergio Luiz
Source: JOURNAL OF APPLIED PHYSICS. Unidade: IF
Subjects: SEMICONDUTORES, RAIOS X
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ABNT
FORNARI, Celso I. et al. Structural properties of 'BI' IND. 2''TE' IND. 3' topological insulator thin films grown by molecular beam epitaxy on (111) 'BA''F' IND. 2' substrates. JOURNAL OF APPLIED PHYSICS, v. 119, n. 16, p. 165303, 2016Tradução . . Disponível em: https://doi.org/10.1063/1.4947266. Acesso em: 27 abr. 2024.
APA
Fornari, C. I., Rappl, P. H. O., Abramof, E., & Morelhao, S. L. (2016). Structural properties of 'BI' IND. 2''TE' IND. 3' topological insulator thin films grown by molecular beam epitaxy on (111) 'BA''F' IND. 2' substrates. JOURNAL OF APPLIED PHYSICS, 119( 16), 165303. doi:10.1063/1.4947266
NLM
Fornari CI, Rappl PHO, Abramof E, Morelhao SL. Structural properties of 'BI' IND. 2''TE' IND. 3' topological insulator thin films grown by molecular beam epitaxy on (111) 'BA''F' IND. 2' substrates [Internet]. JOURNAL OF APPLIED PHYSICS. 2016 ; 119( 16): 165303.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1063/1.4947266
Vancouver
Fornari CI, Rappl PHO, Abramof E, Morelhao SL. Structural properties of 'BI' IND. 2''TE' IND. 3' topological insulator thin films grown by molecular beam epitaxy on (111) 'BA''F' IND. 2' substrates [Internet]. JOURNAL OF APPLIED PHYSICS. 2016 ; 119( 16): 165303.[citado 2024 abr. 27 ] Available from: https://doi.org/10.1063/1.4947266
Relatorio tecnico
Nanoscale characterization of bismuth telluride epitaxic layers by advanced X-ray analysis (2016)
Morelhão, Sergio Luiz; Fornari, Celso I.; Rappl, Paulo H. O.; Abramof, Eduardo
Unidade: IF
Subjects: SEMICONDUTORES, RAIOS X
A citação é gerada automaticamente e pode não estar totalmente de acordo com as normas
ABNT
MORELHÃO, Sergio Luiz et al. Nanoscale characterization of bismuth telluride epitaxic layers by advanced X-ray analysis. . São Paulo: Instituto de Física, Universidade de São Paulo. Disponível em: https://arxiv.org/pdf/1612.09386.pdf. Acesso em: 27 abr. 2024. , 2016
APA
Morelhão, S. L., Fornari, C. I., Rappl, P. H. O., & Abramof, E. (2016). Nanoscale characterization of bismuth telluride epitaxic layers by advanced X-ray analysis. São Paulo: Instituto de Física, Universidade de São Paulo. Recuperado de https://arxiv.org/pdf/1612.09386.pdf
NLM
Morelhão SL, Fornari CI, Rappl PHO, Abramof E. Nanoscale characterization of bismuth telluride epitaxic layers by advanced X-ray analysis [Internet]. 2016 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/1612.09386.pdf
Vancouver
Morelhão SL, Fornari CI, Rappl PHO, Abramof E. Nanoscale characterization of bismuth telluride epitaxic layers by advanced X-ray analysis [Internet]. 2016 ;[citado 2024 abr. 27 ] Available from: https://arxiv.org/pdf/1612.09386.pdf

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